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Multi‐height metasurface for wavefront manipulation fabricated by direct laser writing lithography

Fan Ye, Mike Pivnenko, Huiyu Huang, Xin Chang, Lee Robinson, Youdou Zheng, Yi Shi, Daping Chu

2023Nanophotonics14 citationsDOIOpen Access PDF

Abstract

We introduce two types of dielectric metasurfaces, consisting of 3 × 3 regions, which manipulate wavefront by different feature heights. Both polarization-dependent and polarization-independent metasurfaces are realized for phase depth of 0 ∼ 2π at 1550 nm, with considerable average transmittance of 80.1 and 85.1 %, respectively. The phase modulation capability can be extended over a broadband range of 1460.1-1618.0 nm for optical communications, by carefully designing nanofeature sizes. Moreover, the entire metasurfaces with nanofeatures of varying heights can be fabricated in a single process by using direct laser writing with high-precision, which is beneficial for mass production and promising in developing efficient and ultracompact devices.

Topics & Concepts

LithographyWavefrontMaterials scienceOpticsLaserMaskless lithographyOptoelectronicsNanotechnologyElectron-beam lithographyPhysicsResistLayer (electronics)Metamaterials and Metasurfaces ApplicationsOrbital Angular Momentum in OpticsAdvanced Optical Imaging Technologies
Multi‐height metasurface for wavefront manipulation fabricated by direct laser writing lithography | Litcius