Litcius/Paper detail

Study on material removal mechanisms in electrochemical etching-enhanced polishing of GaN

Linfeng Zhang, Dong Lu, Hui Deng

2021Journal of Manufacturing Processes31 citationsDOI

Topics & Concepts

PolishingMaterials scienceEtching (microfabrication)Layer (electronics)PhotoluminescenceElectrochemistryChemical-mechanical planarizationSurface roughnessSurface finishComposite materialNanotechnologyChemical engineeringOptoelectronicsElectrodeChemistryEngineeringPhysical chemistrySemiconductor materials and devicesGaN-based semiconductor devices and materialsMetal and Thin Film Mechanics
Study on material removal mechanisms in electrochemical etching-enhanced polishing of GaN | Litcius