Fabrication of focused ion beam-deposited nanowire probes for conductive atomic force microscopy
Ewelina Gacka, Bartosz Pruchnik, Magdalena Tamulewicz‐Szwajkowska, Dominik Badura, Ivo W. Rangelow, Teodor Gotszalk
Abstract
• FIBID is a simple and maskless method for fabricating conductive probe nanotips. • Annealing and plasma cleaning of the deposited composite increases the Pt:C ratio. • Conducting current measurements in contact mode did not damage the nanowire probes. • Probes treated with post-processing steps exhibited better conductivity properties. Probe development is crucial for advancing scanning probe microscopy (SPM) techniques. Among the various probe fabrication methods, one of the fastest and most accurate methods is focused ion beam-induced deposition (FIBID). This approach allows nanoscale prototyping of nanoobjects in a single maskless manufacturing step. The chemical composition of the deposited material, which forms the probe, is predefined by an applied precursor. Here, we present a method for tip fabrication using a Ga-focused ion beam (Ga-FIB) and a MeCpPtMe 3 precursor. Nanowire tips were deposited on conventional SPM probes in the FIBID step. The materials were additionally shaped during the Ga-FIB milling process, annealed and purified in oxygen plasma. A tip radius equal to 30 ± 5 nm was achieved. An analysis of their chemical composition was performed, including an indication of their suitability for conductive atomic force microscopy measurements. Finally, a series of current–voltage characteristics were recorded on highly orientated pyrolytic graphite.