A synchrotron-based kilowatt-level radiation source for EUV lithography
Bocheng Jiang, Chao Feng, Changliang Li, Zhenghe Bai, Weishi Wan, Dao Xiang, Qiang Gu, Kun Wang, Qinglei Zhang, Dazhang Huang, Senyu Chen
Abstract
A compact damping ring with a limited circumference of about 160 m is proposed for producing kilowatt-level coherent EUV radiation. The electron bunch in the storage ring is modulated by a 257 nm wavelength seed laser with the help of the angular-dispersion-induced micro-bunching method (Feng and Zhao in Sci Rep 7:4724, 2017), coherent radiation at 13.5 nm with an average power of about 2.5 kW can be achieved with the state-of-the-art accelerator and laser technologies.
Topics & Concepts
Extreme ultraviolet lithographySynchrotron radiationRadiationLaserStorage ringWavelengthOpticsPhysicsLithographyElectronDispersion (optics)OptoelectronicsAtomic physicsMaterials scienceNuclear physicsBeam (structure)Advanced X-ray Imaging TechniquesParticle Accelerators and Free-Electron LasersLaser-Plasma Interactions and Diagnostics