Dual function of rhodium photodeposition on ZnO/ZnS: Enhanced H2 production and photocorrosion suppression in water
Sovann Khan, Valeriia Poliukhova, Nomin Tamir, Jaehyun Park, Norihiro Suzuki, Chiaki Terashima, Ken‐ichi Katsumata, So‐Hye Cho
Abstract
It is widely known that semiconductors such as ZnO and ZnS tend to be unstable in water-splitting photocatalysis due to self-corrosion by the photogenerated charges under prolonged light irradiation. In this work, we demonstrate that proper engineering of photodeposition of Rh species on ZnO–ZnS heterostructure (ZnO/ZnS) can enhance their photocatalytic activity and secure their stability at the same time. During the Rh photodeposition, both electrons and holes generated on the surface of ZnO/ZnS contributed to the formation of Rh0 metal and Rh-oxides on its surface. Our results have shown that as little as 0.02 at.% of Rh photodeposition can dramatically increase the activity and reduce self-corrosion of ZnO/ZnS during photocatalytic H2 production from pure water. The average H2 production rate of our optimal catalyst was 0.05 at.%. Rh-loaded ZnO/ZnS was ∼5.31 mmol−1 g−1 h−1, reaching a maximum quantum efficiency of 22.9% at 365 nm.