Mechanistic Studies on Photocatalytic Overall Water Splitting over Ga<sub>2</sub>O<sub>3</sub>-Based Photocatalysts by <i>Operando</i> MS-FTIR Spectroscopy
Tao Chen, Qian Ding, Xiuli Wang, Zhaochi Feng, Can Li
Abstract
Photocatalytic water splitting on semiconductor photocatalysts is one of the most important physichemical processes, but its surface reaction mechanisms are not fully understood. Based upon the ATR-FTIR investigations combining with the mass spectroscopy (MS) analysis, a direct hydroxyl radical formation mechanism that is different from those observed for other semiconductor photocatalysts is proposed. This study provides the insight into overall water splitting mechanism on Ga2O3-based photocatalysts at a molecular level, and it helps one to further understand the photocatalysis on semiconductor photocatalysts.
Topics & Concepts
PhotocatalysisFourier transform infrared spectroscopySemiconductorSpectroscopyWater splittingPhotochemistryMass spectrometryMaterials scienceChemistryReaction mechanismChemical engineeringCatalysisOptoelectronicsOrganic chemistryPhysicsQuantum mechanicsEngineeringChromatographyAdvanced Photocatalysis TechniquesGa2O3 and related materialsTiO2 Photocatalysis and Solar Cells