Effect of working pressure on Sn/In composition and optoelectronic properties of ITO films prepared by high power impulse magnetron sputtering
Ming-Jie Zhao, Jin-Fa Zhang, Qi-Hui Huang, Wan-Yu Wu, Ming-Chun Tseng, Shui‐Yang Lien, Wen‐Zhang Zhu
Topics & Concepts
High-power impulse magnetron sputteringMaterials scienceSputteringSputter depositionIndium tin oxideElectrical resistivity and conductivityAnalytical Chemistry (journal)OptoelectronicsCavity magnetronOxidizing agentBand gapTorrThin filmChemistryNanotechnologyElectrical engineeringEngineeringChromatographyThermodynamicsOrganic chemistryPhysicsZnO doping and propertiesGas Sensing Nanomaterials and SensorsThin-Film Transistor Technologies