Bias-stress stability of top-gate coplanar a-ITGZO TFTs with HfO2 and HfAlO gate dielectrics
Heesung Kong, Kyoungah Cho, Hosang Lee, Seungjun Lee, Jun-Hyung Lim, Sangsig Kim
Topics & Concepts
Materials scienceThin-film transistorOptoelectronicsGate dielectricDielectricHysteresisAmorphous solidStress (linguistics)Subthreshold swingTransistorThreshold voltageElectrical engineeringLayer (electronics)NanotechnologyCondensed matter physicsVoltageCrystallographyEngineeringPhilosophyLinguisticsChemistryPhysicsThin-Film Transistor TechnologiesSemiconductor materials and devicesSilicon and Solar Cell Technologies