PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
Teresa de los Arcos, Peter Awakowicz, Jan Benedikt, Beatrix Biskup, Marc Böke, Nils Boysen, Rahel Buschhaus, Rainer Dahlmann, Anjana Devi, Tobias Gergs, Jonathan Jenderny, Achim von Keudell, Thomas D. Kühne, Simon Kusmierz, Hendrik Müller, Thomas Mussenbrock, Jan Trieschmann, David Zanders, Frederik Zysk, Guido Grundmeier
Abstract
Abstract This feature article presents recent results on the analysis of plasma/polymer interactions and the nucleation of ultra‐thin plasma films on polymeric substrates. Because of their high importance for the understanding of such processes, in situ analytical approaches of the plasma volume as well as the plasma/substrate interfaces are introduced before the findings on plasma surface chemistry. The plasma activation of polymeric substrates is divided into the understanding of fundamental processes on model substrates and the relevance of polymer surface complexity. Concerning thin film nucleation and growth, both plasma‐enhanced chemical vapor deposition and plasma‐enhanced atomic layer deposition processes as well as the combination of both processes are considered both for model substrates and technical polymers. Based on the comprehensive presentation of recent results, selective perspectives of this research field are discussed.