Polishing performance and material removal mechanism in the solid-phase Fenton reaction based polishing process of SiC wafer using diamond gel disc
Lanxing Xu, Kaiping Feng, Liang Zhao, Yanzhang Gu, Tianchen Zhao, Binghai Lyu
Topics & Concepts
PolishingWaferMaterials scienceDiamondChemical-mechanical planarizationProcess (computing)Phase (matter)Mechanism (biology)MetallurgyComposite materialNanotechnologyChemistryComputer scienceEpistemologyPhilosophyOrganic chemistryOperating systemAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchAdvanced ceramic materials synthesis