Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films
Alexander John Cruz, Giel Arnauts, Martin Obst, Dmitry E. Kravchenko, Philippe M. Vereecken, Steven De Feyter, Ivo Stassen, Tom Hauffman, Rob Ameloot
Abstract
Chemical vapor deposition of metal-organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to a MOF through exposure to linker vapor. We herein report the impact of different metal oxide and metalcone layers as precursors for zeolitic imidazolate framework ZIF-8 films.
Topics & Concepts
FabricationChemical vapor depositionOxideAtomic layer depositionLayer (electronics)Deposition (geology)Metal-organic frameworkPhase (matter)Chemical engineeringMaterials scienceVapor phaseNanotechnologyChemistryInorganic chemistryOrganic chemistryMetallurgyAdsorptionGeologySedimentPathologyThermodynamicsPaleontologyAlternative medicinePhysicsEngineeringMedicineMetal-Organic Frameworks: Synthesis and ApplicationsBoron and Carbon Nanomaterials ResearchCorrosion Behavior and Inhibition