Understanding the contributions of F–, HF, and HF2– to the etching of SiO2 and unveiling the reaction kinetics to represent etching behavior of SiO2 up to pH 5
Bumsik Kim, Wonje Lee, Sangwoo Lim
Topics & Concepts
Etching (microfabrication)Hydrofluoric acidReactive-ion etchingHydrogen fluorideDry etchingChemistryKineticsSiliconMaterials scienceInorganic chemistryAnalytical Chemistry (journal)Chemical engineeringNanotechnologyOrganic chemistryLayer (electronics)Quantum mechanicsEngineeringPhysicsPlasma Diagnostics and ApplicationsNanowire Synthesis and ApplicationsSilicon Nanostructures and Photoluminescence