Fluorine-based plasma treatment for hetero-epitaxial β-Ga2O3 MOSFETs
Yeong Je Jeong, Jeong Yong Yang, Chan Ho Lee, Ryubin Park, Gyeongryul Lee, Roy B. Chung, Geonwook Yoo
Topics & Concepts
Ohmic contactMaterials scienceEpitaxyAnalytical Chemistry (journal)Secondary ion mass spectrometryAnnealing (glass)Contact resistanceElectrical resistivity and conductivitySapphireFluorineField-effect transistorMOSFETTransistorNanotechnologyIonMetallurgyChemistryOpticsVoltageLayer (electronics)LaserPhysicsQuantum mechanicsEngineeringOrganic chemistryChromatographyElectrical engineeringGa2O3 and related materialsZnO doping and propertiesElectronic and Structural Properties of Oxides