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Comparative study on MnO2, Mn2O3, and Mn3O4: Enhancing chemical-mechanical polishing properties of 4H-SiC silicon wafers

Dexing Cui, Baoguo Zhang, Wenhao Xian, Min Liu, Shitong Liu, Pengfei Wu, Ye Wang

2025Materials Science in Semiconductor Processing9 citationsDOI

Topics & Concepts

Materials scienceWaferPolishingChemical-mechanical planarizationSiliconEngineering physicsNanotechnologyComposite materialOptoelectronicsMetallurgyEngineeringAdvanced ceramic materials synthesisAdvanced Surface Polishing TechniquesZnO doping and properties
Comparative study on MnO2, Mn2O3, and Mn3O4: Enhancing chemical-mechanical polishing properties of 4H-SiC silicon wafers | Litcius