Etching characteristics and surface properties of fluorine-doped tin oxide thin films under CF4-based plasma treatment
Wenhui Yu, Jeong Geun Lee, Young-Hee Joo, Bo Hou, Doo‐Seung Um, Chang-Il Kim
Topics & Concepts
Etching (microfabrication)X-ray photoelectron spectroscopyMaterials scienceTin oxideReactive-ion etchingDry etchingPlasma etchingThin filmDopingOxideNanotechnologyOptoelectronicsAnalytical Chemistry (journal)Chemical engineeringLayer (electronics)ChemistryMetallurgyChromatographyEngineeringZnO doping and propertiesGas Sensing Nanomaterials and SensorsThin-Film Transistor Technologies