Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography
Yang Qiao, Guangyue Shi, Ou Zhang, Lixing You, Michaela Vockenhuber, Yasin Ekinci, Feng Luo, Lei Zhang
Topics & Concepts
Extreme ultraviolet lithographyMaterials scienceResistNanoclustersLithographyNext-generation lithographyNanotechnologyX-ray lithographyPhotoresistElectron-beam lithographyZirconiumOptoelectronicsMetallurgyLayer (electronics)Advancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesIon-surface interactions and analysis