Epitaxial Aluminum Scandium Nitride Super High Frequency Acoustic Resonators
Mingyo Park, Zhijian Hao, Rytis Dargis, Andrew Clark, Azadeh Ansari
Abstract
This paper demonstrates super high frequency (SHF) Lamb and surface acoustic wave resonators based on single-crystal orientation Aluminum Scandium Nitride (AlScN) thin films grown on silicon substrates by molecular beam epitaxy (MBE). We report on the experimental frequency response and electromechanical properties of 400 nm-thick crystalline AlScN acoustic resonators with up to 12% Sc/(Sc+Al) ratio. The film thickness is optimized for operation at the SHF range, targeting emerging wireless communication standards, such as 4G LTE/5G. We report on high-performance acoustic devices that take advantage of the crystallinity, and high piezoelectric properties of 400 nm-thick epitaxial AlScN films. Our work presents enhanced effective electromechanical coupling coefficients (k <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">eff</sub> <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ) up to 5.3% and unloaded quality factors (Q <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</sub> ) of ~192 at 3-10 GHz. However, fabrication challenges due to the high-stress levels of sub-micron AlScN epi-layers grown on Si substrates remain challenging and will be discussed in this paper. [2019-0231].