Thickness-dependent behavior of strain relaxation and Sn segregation of GeSn epilayer during rapid thermal annealing
Hongjie Cai, Kun Qian, Yuying An, Guangyang Lin, Songsong Wu, Haokun Ding, Wei Huang, Songyan Chen, Jianyuan Wang, Cheng Li
Topics & Concepts
Materials scienceMolecular beam epitaxyAnnealing (glass)Stress relaxationRelaxation (psychology)Condensed matter physicsOptoelectronicsEpitaxyStrain (injury)CrystallographyNanotechnologyComposite materialChemistryLayer (electronics)Social psychologyPsychologyCreepMedicineInternal medicinePhysicsPhotonic and Optical DevicesAdvanced Photonic Communication SystemsSemiconductor Lasers and Optical Devices