Exploring the influence of Mott–Schottky acquisition parameters on the semiconduction behaviour of modified native aluminium oxide films
Robin Kroll, Z. Henderson, Ben F. Spencer, Pınar Kaya, V. Knoblauch, Dirk Engelberg
Topics & Concepts
AluminiumOxideChemistrySchottky diodeAlloyCapacitanceIsotropic etchingAluminum oxideEtching (microfabrication)Analytical Chemistry (journal)Layer (electronics)Chemical engineeringMaterials scienceOptoelectronicsElectrodePhysical chemistryOrganic chemistryDiodeChromatographyEngineeringAnodic Oxide Films and NanostructuresSemiconductor materials and devicesSemiconductor materials and interfaces