Area-selective atomic layer deposition of Ru thin films using phosphonic acid self-assembled monolayers for metal/dielectric selectivity
Seo-Hyun Lee, Jeong‐Min Lee, Ji Hun Lee, Junghun Kwak, Sung-Woong Chung, Woo‐Hee Kim
Topics & Concepts
Materials scienceAtomic layer depositionSelectivityMonolayerTinDielectricAlkylSelf-assembled monolayerMetalThin filmAdsorptionChemical engineeringLayer (electronics)Deposition (geology)van der Waals forceInorganic chemistryNanotechnologyOrganic chemistryChemistryMoleculeCatalysisOptoelectronicsMetallurgyBiologySedimentEngineeringPaleontologyMolecular Junctions and NanostructuresSemiconductor materials and devicesCopper Interconnects and Reliability