Chemical-mechanical polishing improvements and subsurface damage elimination for Cz grown (010) β-Ga2O3 substrates
Robert M. Lavelle, W.J. Everson, Daniel Erdely, Luke A. M. Lyle, Scott W. Pistner, Samuel R. Hallacher, Joan M. Redwing, David W. Snyder
Topics & Concepts
Materials sciencePolishingChemical-mechanical planarizationMetallurgyComposite materialGa2O3 and related materialsZnO doping and propertiesElectronic and Structural Properties of Oxides