First-principles study of copper contamination in silicon semiconductor
Pei Chen, Yadong Li, Fei Qin, Tong An, Yanwei Dai, Min Zhang, M. Liu, Lipeng Zhang
Topics & Concepts
Materials scienceDiffusion barrierVacancy defectTetragonal crystal systemSiliconSemiconductorDensity functional theoryLattice diffusion coefficientChemical physicsCrystal structureDiffusionCopperCrystallographyCondensed matter physicsNanotechnologyComputational chemistryThermodynamicsOptoelectronicsMetallurgyChemistryEffective diffusion coefficientMagnetic resonance imagingMedicinePhysicsLayer (electronics)RadiologySemiconductor materials and interfacesCopper Interconnects and ReliabilityAluminum Alloys Composites Properties