Synthesis of CeO2 Nanoparticles Derived by Urea Condensation for Chemical Mechanical Polishing
Zhenyang Wang, Tongqing Wang, Lifei Zhang, Xinchun Lu
Topics & Concepts
Materials scienceChemical engineeringNanoparticleZeta potentialChemical-mechanical planarizationParticle sizeSlurryCalcinationPolishingDispersityUreaDynamic light scatteringAdsorptionComposite materialNanotechnologyOrganic chemistryPolymer chemistryCatalysisChemistryEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchSemiconductor materials and devices