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Highly frequency-, temperature-, and bias-stable dielectric properties of 500 °C processed Bi2SiO5 thin films with low dielectric loss

Yifu Ke, Wenhua Huang, Santhosh Kumar Thatikonda, Ruqi Chen, Chuangye Yao, Ni Qin, Dinghua Bao

2020Current Applied Physics13 citationsDOI

Topics & Concepts

DielectricMaterials scienceThin filmDielectric lossAnnealing (glass)CapacitorDielectric spectroscopyAnalytical Chemistry (journal)Composite materialOptoelectronicsNanotechnologyElectrical engineeringChemistryVoltageElectrodePhysical chemistryElectrochemistryEngineeringChromatographyFerroelectric and Piezoelectric MaterialsDielectric properties of ceramicsMicrowave Dielectric Ceramics Synthesis
Highly frequency-, temperature-, and bias-stable dielectric properties of 500 °C processed Bi2SiO5 thin films with low dielectric loss | Litcius