Litcius/Paper detail

Origin of material removal mechanism in shear thickening-chemical polishing

Min Li, Minghui Liu, Oltmann Riemer, Bernhard Karpuschewski, Cheng Tang

2021International Journal of Machine Tools and Manufacture86 citationsDOI

Topics & Concepts

PolishingShearing (physics)DilatantSlurryMaterials scienceChemical reactionShear (geology)Chemical-mechanical planarizationComposite materialThickeningShear rateRheologySurface finishSurface roughnessChemistryBiochemistryPolymer scienceAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationLaser Material Processing Techniques
Origin of material removal mechanism in shear thickening-chemical polishing | Litcius