Dynamic ellipsometry measurement based on a simplified phase-stable dual-comb system
Ruixue Zhang, Liheng Shi, Siyu Zhou, Jinxu Zhang, Bin Liu, Guanhao Wu
Abstract
Spectroscopic ellipsometry is a powerful tool for characterizing thin film, polarization optics, semiconductors, and others. Conventional approaches are subject to restrictions of mechanical instability and measurement speed. The complex locking scheme of previous dual-comb spectroscopic ellipsometry belies its practicability. We present and demonstrate here dynamic spectroscopic ellipsometry based on a simplified phase-stable dual-comb system, which could realize the online dynamic measurement of optical properties of materials. A precision of 1.31 nm and a combined uncertainty of 13.80 nm (k = 2) in the thickness measurement of thin-film samples has been achieved. Moreover, the dynamic performance of the system is investigated under a high data acquisition rate (1 kHz) with a dynamic resolution of ellipsometric parameter better than 0.1 rad.