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Structural effect of inhibitors on adsorption and desorption behaviors during copper electroplating for through-silicon vias

Mengya Dong, Yumei Zhang, Tao Hang, Ming Li

2021Electrochimica Acta26 citationsDOI

Topics & Concepts

DesorptionElectroplatingEthylene glycolAdsorptionPEG ratioCopperElectrochemistryChemical engineeringEthylenediamineSiliconPoloxamerMaterials scienceChemistryInorganic chemistryNanotechnologyPolymerOrganic chemistryElectrodePhysical chemistryCopolymerLayer (electronics)FinanceEconomicsEngineeringElectrodeposition and Electroless CoatingsSemiconductor materials and interfacesElectronic Packaging and Soldering Technologies
Structural effect of inhibitors on adsorption and desorption behaviors during copper electroplating for through-silicon vias | Litcius