Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H2 plasma
Shih‐Nan Hsiao, Kazuya Nakane, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Topics & Concepts
FluorocarbonPlasma-enhanced chemical vapor depositionX-ray photoelectron spectroscopyAnalytical Chemistry (journal)Substrate (aquarium)Fourier transform infrared spectroscopyDissociation (chemistry)HydrogenThin filmMaterials scienceChemistryChemical engineeringPhysical chemistryComposite materialNanotechnologyOrganic chemistryGeologyEngineeringOceanographyMetal and Thin Film MechanicsPlasma Diagnostics and ApplicationsCopper Interconnects and Reliability