Multidielectric-metal laminated solar perfect absorber with ultra-high manufacturing error tolerance
Yan Chen, Shiyi Song, Zhangkun Zhou, Shanjun Chen, Jie Hou, Wen‐Xing Yang
Abstract
Abstract Based on the stacking principle, we designed an ultra-broadband metamaterial perfect absorber (UBMPA) with a pyramidal structure of four Si 3 N 4 -Ti (ST) group stacks. Its average absorptivity achieved 99.4% between 400 and 4000 nm. In addition, the absorber attains an average absorption of 94.5% in the operating band when the edge’s length in the fourth ST group varies with a range greater than ±67%, the average absorption is maintained above 91.8% at an incidence angle of 60° for TE and TM polarization modes. Moreover, the photothermal conversion efficiency of the UBMPA is 93.1% at a working temperature of 1000 K in the range of 280–4000 nm. The proposed stacked absorber is advantageous in terms of ultra-wide operating bandwidth, excellent absorption performance, polarization independence, insensitivity to wide-angle incidence, limited stacking layers, ultra-high manufacturing error tolerance and low fabrication cost, exhibiting significant potential for applications in solar cells, detectors, thermal emitters and other fields.