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Improvement of Si3N4/SiO2 etching selectivity through the passivation of SiO2 surface in aromatic carboxylic acid-added H3PO4 solutions for the 3D NAND integration

Taehyeon Kim, Taegun Park, Sangwoo Lim

2023Applied Surface Science17 citationsDOI

Topics & Concepts

PassivationEtching (microfabrication)Carboxylic acidCovalent bondAdsorptionMaterials scienceHydrogen bondStack (abstract data type)Chemical engineeringChemistryLayer (electronics)Inorganic chemistryOrganic chemistryNanotechnologyPolymer chemistryMoleculeComputer scienceProgramming languageEngineeringSemiconductor materials and devicesSilicon Nanostructures and PhotoluminescenceZnO doping and properties
Improvement of Si3N4/SiO2 etching selectivity through the passivation of SiO2 surface in aromatic carboxylic acid-added H3PO4 solutions for the 3D NAND integration | Litcius