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Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor

Ae Rim Choi, Seunggi Seo, Seiyon Kim, Dohee Kim, Seung‐Wook Ryu, Woo‐Jae Lee, Il‐Kwon Oh

2023Applied Surface Science11 citationsDOI

Topics & Concepts

X-ray photoelectron spectroscopyAtomic layer depositionThin filmChemistryReaction mechanismAmideMoleculeSurface modificationMaterials scienceChemical engineeringNanotechnologyCatalysisPhysical chemistryOrganic chemistryEngineeringSemiconductor materials and devicesElectronic and Structural Properties of OxidesCatalytic Processes in Materials Science
Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor | Litcius