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Attenuation of Photoelectron Emission by a Single Organic Layer

Thorsten Wagner, Graż̇yna Antczak, Michael Györök, Agata Sabik, Anna Volokitina, F. Gołek, P. Zeppenfeld

2022ACS Applied Materials & Interfaces10 citationsDOIOpen Access PDF

Abstract

We report an in situ study of the thin-film growth of cobalt-phthalocyanine on Ag(100) surfaces using photoelectron emission microscopy (PEEM) and the Anderson method. Based on the Fowler-DuBridge theory, we were able to correlate the evolution of the mean electron yield acquired with PEEM for coverages up to two molecular layers of cobalt-phthalocyanine to the global work function changes measured with the Anderson method. For coverages above two monolayers, the transients measured with the Anderson method and those obtained with PEEM show different trends. We exploit this discrepancy to determine the inelastic mean free path of the low-energy electrons while passing through the third layer of CoPc.

Topics & Concepts

Materials scienceWork functionMonolayerMean free pathElectronPhthalocyanineCobaltLayer (electronics)Inelastic mean free pathX-ray photoelectron spectroscopyAnalytical Chemistry (journal)NanotechnologyNuclear magnetic resonanceChemistryPhysicsMetallurgyChromatographyQuantum mechanicsElectron and X-Ray Spectroscopy TechniquesSurface and Thin Film PhenomenaElectronic and Structural Properties of Oxides
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