Litcius/Paper detail

Schottky Barrier Height Engineering in<i>β</i>-Ga<sub>2</sub>O<sub>3</sub>Using SiO<sub>2</sub>Interlayer Dielectric

Arkka Bhattacharyya, Praneeth Ranga, Muad Saleh, Saurav Roy, Michael A. Scarpulla, Kelvin G. Lynn, Sriram Krishnamoorthy

2020IEEE Journal of the Electron Devices Society62 citationsDOIOpen Access PDF

Abstract

This paper reports on the modulation of Schottky barrier heights (SBH) on three different orientations of β-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> by insertion of an ultra-thin SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> dielectric interlayer at the metal-semiconductor junction, which can potentially lower the Fermi-level pinning (FLP) effect due to metal-induced gap states (MIGS). Pt and Ni metal-semiconductor (MS) and metal-interlayer-semiconductor (MIS) Schottky barrier diodes were fabricated on bulk n-type doped β-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> single crystal substrates along the (010), (-201) and (100) orientations and were characterized by room temperature current-voltage (I-V) and capacitance-voltage (C-V) measurements. Pt MIS diodes exhibited 0.53 eV and 0.37 eV increment in SBH along the (010) and (-201) orientations respectively as compared to their respective MS counterparts. The highest SBH of 1.81 eV was achieved on the (010)-oriented MIS SBD using Pt metal. The MIS SBDs on (100)-oriented substrates exhibited a dramatic increment (> 1.5 ×) in SBH as well as reduction in reverse leakage current. The use of thin dielectric interlayers can be an efficient experimental method to modulate SBH of metal/Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> junctions.

Topics & Concepts

Materials scienceSchottky barrierSchottky diodeDielectricDiodeOptoelectronicsMetal–semiconductor junctionDopingLeakage (economics)Single crystalReverse leakage currentCondensed matter physicsGallium arsenideSchottky effectCrystal (programming language)Rectangular potential barrierDielectric lossThin filmSemiconductorBand gapSiliconWide-bandgap semiconductorStress (linguistics)Reverse biasGa2O3 and related materialsSemiconductor materials and interfacesPhotocathodes and Microchannel Plates
Schottky Barrier Height Engineering in<i>β</i>-Ga<sub>2</sub>O<sub>3</sub>Using SiO<sub>2</sub>Interlayer Dielectric | Litcius