Deposition of amorphous carbon nitride thin films using pressure-gradient RF magnetron sputtering and their chemical bonding structures
Masami Aono, Masami Terauchi, Yohei Sato, Kyoji Morita, T. Inoue, Kazuhiro Kanda, Ken Yonezawa
Topics & Concepts
X-ray photoelectron spectroscopyCarbon nitrideAnalytical Chemistry (journal)Sputter depositionMaterials scienceThin filmXANESAmorphous solidCarbon filmSputteringAmorphous carbonChemical stateNitrideChemistrySpectroscopyChemical engineeringNanotechnologyCrystallographyOrganic chemistryLayer (electronics)PhysicsEngineeringPhotocatalysisQuantum mechanicsCatalysisDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsSemiconductor materials and devices