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Comparative Investigation of Band Gap and Gate Metal Engineered Novel Si0.2Ge0.8/GaAs Charge Plasma-Based JLTFET for Improved Electrical Performance

Kaushal Kumar, Ajay Kumar, Vinay Kumar, S. C. Sharma

2023Silicon20 citationsDOI

Topics & Concepts

Ambipolar diffusionMaterials scienceOptoelectronicsSubthreshold slopeTransistorSubthreshold conductionField-effect transistorBand gapTunnel field-effect transistorElectronic circuitElectrical engineeringPlasmaVoltageEngineeringPhysicsQuantum mechanicsAdvancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesFerroelectric and Negative Capacitance Devices
Comparative Investigation of Band Gap and Gate Metal Engineered Novel Si0.2Ge0.8/GaAs Charge Plasma-Based JLTFET for Improved Electrical Performance | Litcius