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Photoresists based on bisphenol A derivatives with tert-butyl ester groups for electron beam lithography

Shengwen Hu, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Guoqiang Yang, Yi Li

2022Journal of Photochemistry and Photobiology A Chemistry16 citationsDOI

Topics & Concepts

ResistPhotoresistBisphenol ALithographyChemistryElectron-beam lithographyPolymer chemistryMaterials sciencePhotochemistryOrganic chemistryOptoelectronicsEpoxyLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesIntegrated Circuits and Semiconductor Failure Analysis
Photoresists based on bisphenol A derivatives with tert-butyl ester groups for electron beam lithography | Litcius