Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy
Lianjia Wu, Ivan Bespalov, Katharina Witte, Olivier Lugier, Jarich Haitjema, Michaela Vockenhuber, Yasin Ekinci, Benjamin Watts, Albert M. Brouwer, Sonia Castellanos
Abstract
A fluorinated ligand in an extreme ultraviolet hybrid photoresist yields C–F bond dissociation upon exposure, thus enhancing its overall sensitivity.
Topics & Concepts
Extreme ultraviolet lithographyPhotoresistMaterials scienceExtreme ultravioletDissociation (chemistry)UltravioletUltraviolet visible spectroscopyPhotochemistryX-rayLigand (biochemistry)NanotechnologyPhysical chemistryOrganic chemistryOpticsOptoelectronicsChemistryLaserPhysicsLayer (electronics)BiochemistryReceptorAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesX-ray Spectroscopy and Fluorescence Analysis