Investigation of recrystallization and stress relaxation in nanosecond laser annealed Si1−xGex/Si epilayers
L. Dagault, S. Kerdilès, Pablo Acosta Alba, Jean‐Michel Hartmann, Jean‐Paul Barnes, Patrice Gergaud, E. Scheid, F. Cristiano
Topics & Concepts
Materials scienceRecrystallization (geology)Annealing (glass)NanosecondCrystallinityUltravioletSurface roughnessDiffractionLaserSurface finishStress relaxationAnalytical Chemistry (journal)OptoelectronicsOpticsComposite materialChemistryChromatographyBiologyPaleontologyCreepPhysicsSilicon and Solar Cell TechnologiesLaser Material Processing Techniquesnanoparticles nucleation surface interactions