Scalable growth of atomically thin MoS2 layers in a conventional MOCVD system using molybdenum dichloride dioxide as the molybdenum source
Xu Yang, Shisheng Li, Naoki Ikeda, Akihiro Ohtake, Yoshiki Sakuma
Topics & Concepts
Chemical vapor depositionMonolayerMetalorganic vapour phase epitaxyMolybdenumMaterials scienceNucleationWaferMolybdenum disulfideSubstrate (aquarium)NanotechnologyThin filmChemical engineeringOptoelectronicsChemistryEpitaxyLayer (electronics)Composite materialMetallurgyOrganic chemistryGeologyEngineeringOceanography2D Materials and ApplicationsPerovskite Materials and ApplicationsMXene and MAX Phase Materials