Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Sixu Lin, Dong Xie, Yongliang Tang, Yiwen Wang, Fengjuan Jing, Nan Huang, Yongxiang Leng
Topics & Concepts
Materials scienceElectron cyclotron resonanceAnalytical Chemistry (journal)Raman spectroscopyChemical vapor depositionCarbon nitrideCarbon filmBand gapAmorphous carbonThin filmChemistryNanotechnologyOptoelectronicsOpticsOrganic chemistryIonPhotocatalysisPhysicsCatalysisDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsPolymer Nanocomposite Synthesis and Irradiation