Atomic layer etching of high-k oxide thin films using hexafluoroacetylacetone and oxygen radicals
Jeongbin Lee, Jieun Oh, Jung‐Tae Kim, Jiwoo Oh, Jeong‐Min Lee, Woo‐Hee Kim, Woo‐Hee Kim
Topics & Concepts
Etching (microfabrication)RadicalLayer (electronics)Atomic oxygenOxideOxygenThin filmAtomic layer depositionMaterials scienceChemical engineeringInorganic chemistryChemistryOxygen atomNanotechnologyOrganic chemistryMoleculeEngineeringSemiconductor materials and devicesCopper Interconnects and ReliabilityElectronic and Structural Properties of Oxides