Fabry-Perot Bragg grating nanoresonator with ultrahigh intrinsic Q based on low-loss silicon nitride
Yang Zhang, Sylvain Veilleux, M. Dagenais
Abstract
Photonic integrated circuits based on ultralow loss silicon nitride waveguides have shown significant promise for realizing high-performance optical systems in a compact and scalable form factor. For the first time, we have developed a Fabry-Perot Bragg grating nanoresonator based on silicon nitride on silicon dioxide platform with an ultra-high intrinsic quality factor of 19.3 million. By combining the introduction of tapered grating between cavity and periodic Bragg grating, increasing the width of cavity to multi-mode region and optimized annealing strategy for Si 3 N 4 film, the propagation loss is reduced to around 0.014 dB/cm. Fabry-Perot Bragg grating nanoresonator can be easily implemented in a simple straight waveguide occupying a minimal amount of space. Therefore, it is a key component to build a high performance photonic integrated circuit for many applications.