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Demonstration of Multiply-Accumulate Operation With 28 nm FeFET Crossbar Array

Sourav De, Franz Müller, Nellie Laleni, Maximilian Lederer, Yannick Raffel, Shaown Mojumder, Alptekin Vardar, Sukhrob Abdulazhanov, Tarek Ali, Stefan Dünkel, Sven Beyer, Konrad Seidel, Thomas Kämpfe

2022IEEE Electron Device Letters54 citationsDOIOpen Access PDF

Abstract

This letter reports a linear multiply-accumulate (MAC) operation conducted on a crossbar memory array based on 28nm high-k metal gate (HKMG) Complementary Metal Oxide Semiconductor (CMOS) and ferroelectric field effect transistor (FeFET). The fabrication is conducted at GlobalFoundries with their standard 28nm technology. The crossbar arrays show a 100% yield in MAC operation on a 300mm wafer. The arrays were divided into <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${8}\times {8}$ </tex-math></inline-formula> segments. The FeFET crossbar arrays were fabricated with access transistors, current-limiter transistors and a current-mode analog-to-digital converter (ADC) on the same wafer. Finally, the data retention characteristics reveal excellent data retention characteristics up to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${5}\times {10} ^{{4}}$ </tex-math></inline-formula> seconds, which makes this memory array suitable for carrying out MAC operations in inference engine applications.

Topics & Concepts

Crossbar switchCMOSTransistorElectrical engineeringMESFETField-effect transistorComputer scienceOptoelectronicsMaterials scienceElectronic engineeringTopology (electrical circuits)EngineeringVoltageFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesAdvanced Memory and Neural Computing
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