Large enhancement of ferroelectric polarization in Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> films by low plasma energy pulsed laser deposition
Tingfeng Song, Raúl Solanas, Mengdi Qian, Ignasi Fina, F. Sánchez
Abstract
PLD of ferroelectric HfO 2 done under a mixed Ar and O 2 atmosphere allows the reduction of the PLD plasma energy, resulting in fewer defects and an increase of the ferroelectric polarization of around 50% compared to films grown by conventional PLD.
Topics & Concepts
FerroelectricityMaterials sciencePulsed laser depositionPolarization (electrochemistry)PlasmaLaserOptoelectronicsThin filmAnalytical Chemistry (journal)OpticsNanotechnologyDielectricChromatographyChemistryPhysicsPhysical chemistryQuantum mechanicsFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesElectronic and Structural Properties of Oxides