Effect of HCl+LiF Etching Process on Electrochemical Performance of Ti<sub>3</sub>C<sub>2</sub>
Yuhua Huang, Weiwei Li, Bingchu Mei, Yu Yang, Zuodong Liu
Abstract
In this paper, the effects of etching temperature and concentrations of hydrochloric acid (HCl) on the exfoliating process and the electrochemical performance of LIBs were systematically explored. The transformation from Ti 3 AlC 2 to Ti 3 C 2 was analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and Raman spectra. The suitable conditions of preparing Ti 3 C 2 MXene though HCl and lithium fluoride (LiF) were obtained. Besides, the in-situ oxidation conditions of Ti 3 C 2 during the etching process were studied. The TiO 2 /Ti 3 C 2 was beneficial to improve the specific capacity from 125[Formula: see text]mAh[Formula: see text]g[Formula: see text] to 150[Formula: see text]mAh[Formula: see text]g[Formula: see text] at 1 C.