Optimal ITO transparent conductive layers for InGaN-based amber/red light-emitting diodes
Zhe Zhuang, Daisuke Iida, Pavel Kirilenko, Martin Velazquez‐Rizo, Kazuhiro Ohkawa
Abstract
Fabrication of indium tin oxide (ITO) was optimized for InGaN-based amber/red light-emitting diodes (LEDs). A radiofrequency sputtering reduced the sheet resistivity of ITO at low pressures, and a subsequent two-step annealing resulted in a low sheet resistivity (below 2×10 −4 Ωcm) and high transmittance (over 98%) in the amber and red regions between 590 nm to 780 nm. Double ITO layers by sputtering could form an excellent ohmic contact with p-GaN. Application of the double ITO layers on amber and red LEDs enhanced light output power by 15.6% and 13.0%, respectively, compared to those using ITO by e-beam evaporation.
Topics & Concepts
Materials scienceLight-emitting diodeIndium tin oxideOptoelectronicsOhmic contactTransmittanceDiodeFabricationOpticsAnnealing (glass)Electrical resistivity and conductivitySputteringThin filmLayer (electronics)NanotechnologyComposite materialPhysicsEngineeringAlternative medicineMedicinePathologyElectrical engineeringGaN-based semiconductor devices and materialsZnO doping and propertiesSemiconductor Quantum Structures and Devices