Effect on passivation mechanism and properties of HfO2/crystalline-Si interface under different annealing atmosphere
Xiaoying Zhang, Jing Han, Yao-Tian Wang, Yu-Jiao Ruan, Wan-Yu Wu, Dong‐Sing Wuu, Juan Zuo, Feng‐Min Lai, Shui‐Yang Lien, Wen‐Zhang Zhu
Topics & Concepts
PassivationAnnealing (glass)WaferMaterials scienceForming gasCarrier lifetimeAnalytical Chemistry (journal)Crystalline siliconOxideSiliconThin filmOptoelectronicsNanotechnologyMetallurgyLayer (electronics)ChemistryChromatographySemiconductor materials and devicesSilicon and Solar Cell TechnologiesSemiconductor materials and interfaces