Directional imbalance of Bloch surface waves for ultrasensitive displacement metrology
Ruxue Wang, Xinrui Lei, Yi Jin, Xiaolei Wen, Luping Du, Aimin Wu, Anatoly V. Zayats, Xiaocong Yuan
Abstract
over a 300 nm linearity range, resulting in a resolution below 8 nm for a 600 nm illumination wavelength. The proposed facile configuration may have potential applications in nanometrology and super-resolution microscopy.
Topics & Concepts
MetrologyDisplacement (psychology)Sensitivity (control systems)Resolution (logic)OpticsPhysicsMaterials scienceComputer scienceElectronic engineeringEngineeringPsychologyArtificial intelligencePsychotherapistAdvanced Fiber Optic SensorsPhotonic and Optical DevicesAdvanced Measurement and Metrology Techniques