17‐3: An 8.3‐inch 1058‐ppi OLED Display with Side‐by‐Side Pixel Structure Fully Fabricated by Photolithography
Shingo Eguchi, Takayuki Oide, Sho Kato, Akihiro Chida, Koji Kusunoki, Yasutaka Nakazawa, Satoru Idojiri, Ken‐ichi Okazaki, Shunpei Yamazaki
Abstract
We developed a patterning technology via photolithography that does not use a fine metal mask to achieve high resolution for all RGB pixels. An 8.3‐inch 1058‐ppi organic light‐ emitting diode (OLED) display was prototyped using the technology for an oxide semiconductor backplane over a glass substrate. Having no restriction on alignment accuracy, metal mask washing, running costs, etc. in the manufacturing process of medium‐ or large‐sized OLED displays, this technology holds promise for enabling the mass production.
Topics & Concepts
OLEDPhotolithographyOptoelectronicsMaterials scienceBackplanePixelDiodeRGB color modelPhotomaskLithographyAMOLEDOpticsComputer scienceThin-film transistorComputer hardwareNanotechnologyResistPhysicsActive matrixArtificial intelligenceLayer (electronics)Thin-Film Transistor TechnologiesImage and Video Quality AssessmentNanofabrication and Lithography Techniques