X-ray Diffraction Analysis of Damaged Layer During Polishing of Silicon Carbide
Hokyoung Jung, Seonho Jeong, Youngwook Park, Yeongil Shin, Haedo Jeong
Topics & Concepts
Full width at half maximumPolishingMaterials scienceScanning electron microscopeSilicon carbideSurface roughnessTransmission electron microscopyLayer (electronics)DiffractionSurface finishSiliconOpticsComposite materialAnalytical Chemistry (journal)NanotechnologyMetallurgyOptoelectronicsChemistryPhysicsChromatographyAdvanced Surface Polishing TechniquesMetal and Thin Film MechanicsIntegrated Circuits and Semiconductor Failure Analysis